China Tests Homegrown EUV Chip Machine, Defying Western Controls

• China is testing a prototype of a homegrown EUV lithography machine in Shenzhen, a major step towards semiconductor independence.
• The project, a secret six-year government initiative, involved former ASML engineers who reverse-engineered the Dutch company's technology.
• The prototype is operational and generates EUV light, but has not yet produced working chips; China aims for 2028-2030.
• Huawei plays a key coordinating role in this "Manhattan Project"-like effort, recruiting top talent and salvaging parts.
• This breakthrough challenges Western efforts, including US export controls, to restrict China's access to advanced chip technology.

Why It Matters: China's EUV prototype signals accelerated progress towards chip self-sufficiency, despite Western restrictions.